Welcome

Session 1 - Mechanical cleaning: AFM

Session 2 - Chemical mechanical cleaning: high velocity aerosol

Coffee break

Session 2 - Chemical mechanical cleaning: high velocity aerosol

Poster announcement session 1

Lunch - Poster session

Session 3 - Chemical mechanical particle removal: megasonics

Coffee break

Session 4 - Damage: high A/R structures and charge

Poster announcement session 2

Exhibitor reception - Poster session

Session 5 - BEOL

Coffee break

Session 5 -BEOL

Lunch - Poster session

Session 6 - FEOL photoresist removal

Coffee break

Session 7 - Ge, III-V and new materials surface chemistry ("FEOL")

Conference dinner

Session 8 - Photovoltaic applications

Coffee break

Session 8 - Photovoltaic applications

Lunch - Poster session

Session 9 - Contamination control: metal and organic contamination

Coffee break

Session 10 - FEOL: etching

Session 11 - Drying: drying marks

Best Student Paper Award

Closure

Olivier Joubert is a director of research at CNRS, France. He received a PhD degree from Grenoble University in France. He spent three years (1992-1995) working in plasma etching groups at Bell Labs, New Jersey and IBM Yorktown Heights. Since 1999, he has started a new CNRS laboratory located in CEA-LETI, the « Laboratoire des Technologies de la Microelectronique », where joint research programs are conducted with LETI and STMicroelectronics in the field of plasma processes. His current research is dedicated to the optimisation and characterization of plasma processes of new materials integrated in advanced CMOS devices. He has authored more than 130 publications in the open literature and given over 40 invited talks in international conferences. Dr Joubert has also served in the scientific committees of the American Vacuum Society conference (USA), Dry Process Symposium (Japan), SPIE (USA).

Andrew Kummel is a Professor of Chemistry and Biochemistry at the University of California San Diego and an affiliated faculty member in several engineering departments.  He received his BS in Chemical Engineering from Yale U, his MS in Chemical Engineering From Stanford University, and his PhD is Chemistry from Stanford University; he was a postdoctoral associate at Cornell University.  His current research interests include (a) oxide-semiconductor interfaces (scanning tunneling microscopy of ALD of gate oxides on semiconductors, density functional molecular dynamics modeling of oxide-semiconductor interfaces) (b) organic interfaces  (molecular beam and STM studies of metal coordination complexes  and fabrication of ultra low voltage chemically sensitive field effect transistors, and (c) cancer detection (development of automated imaging algorithms and synthesis of hollow nanoparticle imaging enhancement agents).